Laser scanner for direct writing lithography.

Low-cost direct writing lithography system for the sub-micron range

We have developed a fixed beam direct writing laser lithography system with a resolution of 400 nm at 457 nm wavelength and a writing speed of 4.2 mm/s with total system costs of less than 100 000 US$. Keyword: Laser lithography system

Fabrication of cantilever based mass sensors integrated with CMOS using direct write laser lithography on resist

A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standar...

Micro-optical elements with arbitrary surfaces

We present a comparison of three different technologies for the fabrication of microoptical elements with arbitrary surfaces. We used direct laser writing, binary mask lithography in combination with reactive ion etching, and graytone lithography.

Micropatterning of cell attachment on pSi films by direct laser writing

Photopolymerization Inhibition Dynamics for Sub-Diffraction Direct Laser Writing Lithography

Selective inhibition of the polymerization leads to sub-diffraction feature sizes in direct writing lithography-a principle based on the idea of stimulated emission depletion (STED) microscopy. However, the detailed understanding of the inhibition process is a key point to further enhance the resolution of the system. The authors present experiments focused on the time dynamics of the inhibitio...